Epeius 1000 PVD equipment
--Flexible Chamber
Epeius 1000® is designed exclusively for Decoration coating. The chamber available for customized provides a large size selection.we can make chamber even bigger than you thought so you may finish more work in an one batch. The Maitaince is easy because the shields is easy to change.In Epeius 1000® ,all technologies can be hybride in one chamber.A group of turbo pump for higher demand creates a strictly environment to ensure a flawless finish, free of imperfections. We also provide deffusion pump as another choice.
--Short Cycle Time
The new Circular arc coating technology(CARC) technology just march at double time. As we all know, time is money. One batch needs less cycle time than ever,however ,without losing coating quality. To define the cost of ownership of a machine, speed is an important factor, as well as optimized heating and cooling techniques. It turns out that the batch costs of our new CARC technology improved 44%. On the other hand,target costs per batch reduced with 83%.
--More Color To do
--Priority Technology
• High Power Impulse Magnetron Sputtering (HIPIMS) has given a third dimension to PVD coating technology. HIPIMS technology shows that it is possible to combine the advantages of high ionization like arc evaporation with the advantages of magnetron sputtering. The result is good adhesion and a dense, very smooth coating.
• Unbalanced Magnetron Sputtering (UBM) is a PVD coating technology that uses extra magnetic coils to intensify the plasma close to the product. The result is a more dense sputtered coating. Because more energy is involved in unbalanced magnetron sputtering, the temperatures during process are higher
• Closed Field Magnetron Sputtering(CFMS) uses magnetic fields in such a way that the plasma is caged in. Less target material is lost to the chamber walls and the plasma moves closer to the substrate. The result is a dense sputtered coating, while the walls of the vacuum chamber remain relatively clean
• Dual Magnetron Sputtering (DMS) is a PVD coating technology used to apply non-conductive coatings. An alternating current (AC) is used between the sputter cathodes, instead of a direct current (DC) between sputter cathode and wall. Thus it achieves a self-cleaning effect of the targets. Dual magnetron sputtering is used for deposition of e.g. oxide coating at high speed
• Circular arc coating technology(CARC) is best with Fast deposition speed ,Smooth coatings , Reliable technology
• Due to rotating thermo couples near the tools, accurate control of the process temperature will be guaranteed.
--Easy Maintaince
the chamber shields are easy to exchange, there is good access for target replacemen
--Free to get all the standard Sinoarc Coating Process
Technical Specifications | |
---|---|
Effective coating Volume | Customized |
Load mass | Customized |
Door | 1 Door |
Arc Cathode | Rectangle / circular / hybride |
Technologies | magnetron sputter(HIPIMS,UBM,DMS,CFMS)Cathodic Arc,Hybride |
Turbo Pump | Up to 3 Turbo pump |